In silico design of a thermal atomic layer etch process of cobalt

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In silico design of a thermal atomic layer etch process of cobalt

Year of publication

2021

Authors

Kondati Natarajan, Suresh; Nolan, Michael; Theofanis, Patrick; Mokhtarzadeh, Charles; Clendenning, Scott B.

Organizations and authors

Aalto University

Kondati Natarajan Suresh

Publication type

Publication format

Article

Parent publication type

Journal

Article type

Original article

Audience

Scientific

Peer-reviewed

Peer-Reviewed

MINEDU's publication type classification code

A1 Journal article (refereed), original research

Publication channel information

Journal

Journal of Vacuum Science and Technology A

Publisher

AVS Science and Technology Society

Volume

39

Issue

2

Article number

022603

ISSN

0734-2101

​Publication forum

62085

​Publication forum level

1

Open access

Open access in the publisher’s service

No

Self-archived

Yes

Other information

Fields of science

Computer and information sciences; Electronic, automation and communications engineering, electronics

Internationality of the publisher

International

Language

English

International co-publication

Yes

Co-publication with a company

Yes

DOI

10.1116/6.0000804

The publication is included in the Ministry of Education and Culture’s Publication data collection

Yes